Invented 20 years ago, nanoimprint lithography offers a powerful manufacturing alternative for the semiconductor and other nanotechnology sectors, says Helmut Schift Pressing matter A technician from ...
TOKYO--(BUSINESS WIRE)-- Dai Nippon Printing Co., Ltd. (DNP, TOKYO:7912) today announced the development of a nanoimprint lithography (NIL) template featuring a circuit line width of 10 nanometers (nm ...
Nanoimprint lithography (NIL) encompasses a suite of high-resolution, high-throughput patterning methods in which a mould bearing nanoscale features is pressed into a deformable resist to transfer ...
Figure 1. Basic imprinting type of nanoimprinting lithography. (a) Thermal NIL developed by Chou. (b) UV-imprinting/step-flash imprinting developed by Willson ...
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